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2014년 2학기

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전자재료 합성 및 공정과 관련된 기초 현상들.

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Semiconductor: a general introduction

차시별 강의

1.	Semiconductor: a general introduction	Crystal structures
	Semiconductor: a general introduction	Crystal structures
2.	Semiconductor: a general introduction	Crystal structures
	Carrier modeling	Quantization concept, Semiconductor model, Carrier properties, Carrier concentrations
3.	Carrier modeling	Quantization concept, Semiconductor model, Carrier properties, Carrier concentrations
4.	Carrier modeling	Quantization concept, Semiconductor model, Carrier properties, Carrier concentrations
5.	Carrier modeling	Quantization concept, Semiconductor model, Carrier properties, Carrier concentrations
6.	Carrier modeling	Quantization concept, Semiconductor model, Carrier properties, Carrier concentrations
7.	Carrier modeling	Quantization concept, Semiconductor model, Carrier properties, Carrier concentrations
8.	Carrier Action	Dirft, Diffusion
9.	Carrier Action	Dirft, Diffusion
10.	Carrier Action	Recombination-generation
11.	Carrier Action	Recombination-generation
12.	Carrier Action	Equations of state
13.	Carrier Action	Equations of state
14.	pn junction diodes	pn junction electrostatics
15.	pn junction diodes	pn junction electrostatics
	pn junction diodes	pn junction electrostatics
	pn junction diodes	Ideal diode equation
	pn junction diodes	Ideal diode equation
	pn junction diodes	Ideal diode equation
	pn junction diodes	Deviations from the ideal behavior
	MS contacts and Schottky diodes	Ideal MS contact, Schottky diodes
	MS contacts and Schottky diodes	Ideal MS contact, Schottky diodes
	MS contacts and Schottky diodes	Ideal MS contact, Schottky diodes
	MOS fundamentals	Electrostatics for MOS
	MOS fundamentals	Electrostatics for MOS
	MOS fundamentals	Electrostatics for MOS
	MOS fundamentals	Electrostatics for MOS
	MOS fundamentals	CV characteristics of the ideal MOS
	MOS fundamentals	CV characteristics of the ideal MOS
	MOSFETs	Theory of MOSFET operation
	MOSFETs	Theory of MOSFET operation
	MOSFETs	Theory of MOSFET operation
	non-ideal MOS	Metal-semiconducto workfunction difference, Oxide charges
	non-ideal MOS	MOSFET threshold
	Basics of Device Fabrication	Fabrication processes
	Basics of Device Fabrication	Fabrication processes

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운영자2019-06-04 14:18: KOCW입니다. 15차시 10-15까지의 MOS fundamentals 강의 32분부터 확인하였으나 음성은 정상적으로 나오는 것을 확인했습니다.이용방법 바로가기의 안내대로 인터넷 설정을 변경하고 다시 이용해 보시기 바랍니다.